commit 197743ff9c6ffb7bc96004c38b518fd3941948b0
author Nader Jawad <njawad@google.com> Mon Apr 19 19:45:13 2021 -0700
committer Nader Jawad <njawad@google.com> Mon May 03 18:08:47 2021 -0700
tree 833d7f67ff16d4bf478710e0c711fe4ffce06844
parent 9443a3e84d73d3423ede16e158b641fb320910dd

Update hole punch logic in HWUI

--Updated HWUI holepunch logic for SurfaceView to
also apply the stretch to the hole punch
--Updated RenderNode callbacks to also include
an offset from the ancestor RenderNode that also
has a stretch configured on it
--Added new test activity to verify hole punch
logic

Bug: 179047472
Test: manual
Change-Id: Ibbaf8248a31839ba9dc352ecb9fef54e1276918e

libs/hwui/RenderNode.h

diff --git a/libs/hwui/RenderNode.h b/libs/hwui/RenderNode.h
index 988141f..6a0b1aa 100644
--- a/libs/hwui/RenderNode.h
+++ b/libs/hwui/RenderNode.h
@@ -40,6 +40,7 @@
 #include "pipeline/skia/SkiaLayer.h"
 
 #include <vector>
+#include <pipeline/skia/StretchMask.h>
 
 class SkBitmap;
 class SkPaint;
@@ -127,6 +128,8 @@
         }
     }
 
+    StretchMask& getStretchMask() { return mStretchMask; }
+
     VirtualLightRefBase* getUserContext() const { return mUserContext.get(); }
 
     void setUserContext(VirtualLightRefBase* context) { mUserContext = context; }
@@ -286,6 +289,7 @@
     UsageHint mUsageHint = UsageHint::Unknown;
 
     bool mHasHolePunches;
+    StretchMask mStretchMask;
 
     // METHODS & FIELDS ONLY USED BY THE SKIA RENDERER
 public: